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[IEEE International Symposium on VLSI Technology Systems and Applications - Taipei, Taiwan (8-10 June 1999)] 1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453) - CMP of polyimide for low-k dielectric application in ULSI
Ya-Li Tai,, Bau-Tong Dai,, Ming-Shih Tsai,, I-Chung Tung,, Ming-Shiann Feng,Year:
1999
Language:
english
DOI:
10.1109/vtsa.1999.786020
File:
PDF, 356 KB
english, 1999