[IEEE IEEE International Electron Devices Meeting 2003 - Washington, DC, USA (8-10 Dec. 2003)] IEEE International Electron Devices Meeting 2003 - A 65nm node strained SOI technology with slim spacer
Fu-Liang Yang,, Chien-Chao Huang,, Hou-Yu Chen,, Jhon-Jhy Liaw,, Tang-Xuan Chung,, Hung-Wei Chen,, Chang-Yun Chang,, Cheng Chuan Huang,, Kuang-Hsin Chen,, Di-Hong Lee,, Hsun-Chih Tsao,, CheYear:
2003
Language:
english
DOI:
10.1109/iedm.2003.1269359
File:
PDF, 252 KB
english, 2003