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Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography
Gonsalves, Kenneth E., Wang, Mingxing, Lee, Cheng-Tsung, Yueh, Wang, Tapia-Tapia, Melina, Batina, Nikola, Henderson, Clifford L.Volume:
19
Year:
2009
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/b818612j
File:
PDF, 806 KB
english, 2009