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Pattern formation of polyimide by using photosensitive polybenzoxazole as a top layer
Tomohito Ogura, Tomoya Higashihara, Mitsuru UedaVolume:
46
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.eurpolymj.2010.04.004
File:
PDF, 872 KB
english, 2010