![](/img/cover-not-exists.png)
[IEEE 2012 4th Electronic System-Integration Technology Conference (ESTC) - Amsterdam, Netherlands (2012.09.17-2012.09.20)] 2012 4th Electronic System-Integration Technology Conference - Concept of Spatially-divided Deep Reactive Ion Etching of Si using oxide atomic layer deposition in the passivation cycle
Roozeboom, F., Kniknie, B., Knaapen, R., Smets, M., Illiberi, A., Poodt, P., Dingemans, G., Keuning, W., Kessels, W. M. M.Year:
2012
Language:
english
DOI:
10.1109/estc.2012.6542052
File:
PDF, 2.60 MB
english, 2012