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[IEEE 2012 IEEE International Reliability Physics Symposium (IRPS) - Anaheim, CA, USA (2012.04.15-2012.04.19)] 2012 IEEE International Reliability Physics Symposium (IRPS) - Reliability characterization of 32nm high-k metal gate SOI technology with embedded DRAM
Mittl, Steve, Swift, Ann, Wu, Ernest, Ioannou, Dimitris, Chen, Fen, Massey, Greg, Rahim, Nilufa, Hauser, Mike, Hyde, Paul, Lukaitis, Joe, Rauch, Stew, Saroop, Sudesh, Wang, YanfengYear:
2012
Language:
english
DOI:
10.1109/irps.2012.6241866
File:
PDF, 640 KB
english, 2012