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[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - Evaluation of the effective image blurring factors in the synchrotron proximity X-ray lithography simulation
Yongduck Seo,, Ohyun Kim,Year:
2000
Language:
english
DOI:
10.1109/imnc.2000.872624
File:
PDF, 140 KB
english, 2000