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[IEEE 12th IEEE International Conference on Advanced Thermal Processing of Semiconductors - Portland, OR, USA (28-30 Sept. 2004)] 12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. - Dynamic surface anneal: activation without diffusion
Jennings, D., Mayur, A., Parihar, V., Haifan Liang,, Mcintosh, R., Adams, B., Thomas, T., Ranish, J., Hunter, A., Trowbridge, T., Achutharaman, R., Thakur, R.Year:
2004
Language:
english
DOI:
10.1109/rtp.2004.1441892
File:
PDF, 542 KB
english, 2004