Lithography Options for the 32 nm Half Pitch Node and...

IEEE Transactions on Circuits and Systems I: Regular Papers 2009 / 08 Vol. 56; Iss. 8

Lithography Options for the 32 nm Half Pitch Node and Beyond

Ronse, K., Jansen, P., Gronheid, R., Hendrickx, E., Maenhoudt, M., Wiaux, V., Goethals, A.-M., Jonckheere, R., Vandenberghe, G.
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Volume:
56
Language:
english
Journal:
IEEE Transactions on Circuits and Systems I: Regular Papers
DOI:
10.1109/tcsi.2009.2028417
Date:
August, 2009
File:
PDF, 3.01 MB
english, 2009
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