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[IEEE IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest. - Tempe, Arizon, USA (Dec. 5, 2005)] IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest. - High performance k=2.5 ULK backend solution using an improved TFHM architecture, extendible to the 45nm technology node
Fox, R., Hinsinger, O., Richard, E., Sabouret, E., Berger, T., Goldberg, C., Humbert, A., Imbert, G., Brun, P., Ollier, E., Maurice, C., Guillermet, M., Monget, C., Plantier, V., Bono, H., Zaleski, M.Year:
2005
Language:
english
DOI:
10.1109/iedm.2005.1609272
File:
PDF, 607 KB
english, 2005