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Hafnium carbamates and ureates: new class of precursors for low-temperature growth of HfO2 thin films
Pothiraja, Ramasamy, Milanov, Andrian P., Barreca, Davide, Gasparotto, Alberto, Becker, Hans-Werner, Winter, Manuela, Fischer, Roland A., Devi, AnjanaYear:
2009
Language:
english
Journal:
Chemical Communications
DOI:
10.1039/b821128k
File:
PDF, 642 KB
english, 2009