[IEEE 2012 12th International Conference on Numerical...

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[IEEE 2012 12th International Conference on Numerical Simulation of Optoelectronic Devices (NUSOD) - Shanghai, China (2012.08.28-2012.08.31)] 2012 12th International Conference on Numerical Simulation of Optoelectronic Devices (NUSOD) - An evaluation of photoresist thickness for semiellipsoid microlens fabrication before thermal reflow using the prolate spheroid approximation

Hung, Shih-Yu, Hung, Chien-Hsin
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Year:
2012
Language:
english
DOI:
10.1109/nusod.2012.6316533
File:
PDF, 732 KB
english, 2012
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