Focus and CD Control by Scatterometry Measurements for...

IEEE Transactions on Semiconductor Manufacturing 2009 / 11 Vol. 22; Iss. 4

Focus and CD Control by Scatterometry Measurements for 65/45 nm Node Devices

Kawachi, T., Fudo, H., Yamashita, S., Narimatsu, K., Yamamoto, K., Miwa, T., Matsumoto, S.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
22
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2009.2031761
Date:
November, 2009
File:
PDF, 1.86 MB
english, 2009
Conversion to is in progress
Conversion to is failed