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[IEEE 1992 Symposium on VLSI Technology Digest of Technical Papers - Seattle, WA, USA (2-4 June 1992)] 1992 Symposium on VLSI Technology Digest of Technical Papers - Suppression of the MOS transistor hot carrier degradation caused by water desorbed from intermetal dielectric
Shimokawa, K., Usami, T., Tokitou, S., Hirashita, N., Yoshimaru, M., Ino, M.Year:
1992
Language:
english
DOI:
10.1109/vlsit.1992.200666
File:
PDF, 207 KB
english, 1992