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[IEEE 2005 International Conference on MEMS,NANO and Smart Systems - Banff, AB, Canada (24-27 July 2005)] 2005 International Conference on MEMS,NANO and Smart Systems - ON THE EFFECT OF CATIONIC SURFACTANTS IN THE RINSE TO REDUCE PATTERN COLLAPSE IN HIGH ASPECT RATIO PATTERNING OF PHOTORESISTS
Grundke, K., Drechsler, A., Petong, N., Bellmann, C., Stamm, M., Wunnicke, O., Reichelt, J., Mage, I., Pinter, B., Pearce, T., Voigt, M.Year:
2005
Language:
english
DOI:
10.1109/icmens.2005.93
File:
PDF, 237 KB
english, 2005