[IEEE 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. - San Jose, CA, USA (8-10 Oct. 2001)] 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) - Development of photo-resist stripping process using ozone and water vapor
Noda, S., Miyamoto, M., Horibe, H., Oya, I., Kuzumoto, M., Kataoka, T.Year:
2001
Language:
english
DOI:
10.1109/issm.2001.962956
File:
PDF, 423 KB
english, 2001