2-Step plasma-enhanced CVD for low-temperature fabrication of silica membranes with high gas-separation performance
Tsuru, Toshinori, Shigemoto, Hironobu, Kanezashi, Masakoto, Yoshioka, TomohisaVolume:
47
Year:
2011
Language:
english
Journal:
Chemical Communications
DOI:
10.1039/c1cc12147b
File:
PDF, 1.37 MB
english, 2011