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Deposition of Ru and RuO2 thin films employing dicarbonyl bis-diketonate ruthenium complexes as CVD source reagents
Lai, Ying-Hui, Chen, Yao-Lun, Chi, Yun, Liu, Chao-Shiuan, Carty, Arthur J., Peng, Shie-Ming, Lee, Gene-HsiangVolume:
13
Year:
2003
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/b300517h
File:
PDF, 334 KB
english, 2003