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[IEEE IEEE 2002 International Interconnect Technology Conference - Burlingame, CA, USA (3-5 June 2002)] Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519) - Integration challenges of 0.1 μm CMOS Cu/low-k interconnects
Yu, K.C., Werking, J., Prindle, C., Kiene, M., Ng, M.-F., Wilson, B., Singhal, A., Stephens, T., Huang, F., Sparks, T., Aminpur, M., Linville, J., Denning, D., Brennan, B., Shahvandi, I., Wang, C., FlYear:
2002
Language:
english
DOI:
10.1109/iitc.2002.1014870
File:
PDF, 236 KB
english, 2002