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[IEEE 2010 International Workshop on Junction Technology (IWJT) - Shanghai, China (2010.05.10-2010.05.11)] 2010 International Workshop on Junction Technology Extended Abstracts - Advanced techniques for achieving ultra-shallow junctions in future CMOS devices

Barnett, Joel, Hill, Richard, Loh, Wei-Yip, Hobbs, Chris, Majhi, Prashant, Jammy, Raj
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Year:
2010
Language:
english
DOI:
10.1109/iwjt.2010.5474968
File:
PDF, 694 KB
english, 2010
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