[IEEE 2010 International Workshop on Junction Technology (IWJT) - Shanghai, China (2010.05.10-2010.05.11)] 2010 International Workshop on Junction Technology Extended Abstracts - Advanced techniques for achieving ultra-shallow junctions in future CMOS devices
Barnett, Joel, Hill, Richard, Loh, Wei-Yip, Hobbs, Chris, Majhi, Prashant, Jammy, RajYear:
2010
Language:
english
DOI:
10.1109/iwjt.2010.5474968
File:
PDF, 694 KB
english, 2010