Depth profiling of a Co-implanted silicon wafer by...

Depth profiling of a Co-implanted silicon wafer by total-reflection X-ray fluorescence analysis after repeated oxidation and HF-etching

Klockenkämper, R., von Bohlen, A.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
36
Year:
1999
Language:
english
Journal:
Analytical Communications
DOI:
10.1039/a809804b
File:
PDF, 121 KB
english, 1999
Conversion to is in progress
Conversion to is failed