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[IEEE 2010 IEEE International Memory Workshop - Seoul, Korea (South) (2010.05.16-2010.05.19)] 2010 IEEE International Memory Workshop - The challenges and limitations on triple level cell geometry and process beyond 20 nm NAND Flash technology
Lee, Yunbong, Park, Byoungjun, Yun, DaeHwan, Jeong, YeonJoo, Kim, Pyoung Hwa, Park, Ji Yul, Yang, Hae chang, Cho, Myoung Kwan, Ahn, Kun-Ok, Yohwan Koh,Year:
2010
Language:
english
DOI:
10.1109/imw.2010.5488388
File:
PDF, 502 KB
english, 2010