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[IEEE Extended Abstracts of the Fourth International Workshop on Junction Technology - Shanghai, China (15-16 March 2004)] The Fourth International Workshop on Junction Technology, 2004. IWJT '04. - Elevated temperature plasma doping technology for sub-50 nm SOI n-MOSFETs
Won-ju Cho,, Chang-geun Ahn,, Kiju Im,, Jong-Heon Yang,, Jihun Oh,, In-Bok Baek,, Seongjae Lee,Year:
2004
Language:
english
DOI:
10.1109/iwjt.2004.1306759
File:
PDF, 185 KB
english, 2004