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[IEEE kshop on Junction Technology - Osaka, Japan (2005.06.7-2005.06.8)] Extended Abstracts of the Fifth International Workshop on Junction Technology - N/sup +//p ultra-shallow junction with low energy bismuth ion-implantation at low temperature
Dongkyu Lee,, Sungkweon Back,, Shahram Ghanad Tavakoli,, Sungho Heo,, Hyunsang Hwang,Year:
2005
Language:
english
DOI:
10.1109/iwjt.2005.203874
File:
PDF, 1.43 MB
english, 2005