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[IEEE 2005 International Conference on Integrated Circuit Design and Technology, 2005. ICICDT 2005. - Austin, TX, USA (2005.05.11-2005.05.11)] 2005 International Conference on Integrated Circuit Design and Technology, 2005. ICICDT 2005. - Effect of deuterium anneal on thin gate oxide reliability

Cellere, G., Paccagnella, A., Valentinr, M.G., Alessandri, M.
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Year:
2005
Language:
english
DOI:
10.1109/icicdt.2005.1502612
File:
PDF, 642 KB
english, 2005
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