[IEEE 2005 International Conference on Integrated Circuit Design and Technology, 2005. ICICDT 2005. - Austin, TX, USA (2005.05.11-2005.05.11)] 2005 International Conference on Integrated Circuit Design and Technology, 2005. ICICDT 2005. - Effect of deuterium anneal on thin gate oxide reliability
Cellere, G., Paccagnella, A., Valentinr, M.G., Alessandri, M.Year:
2005
Language:
english
DOI:
10.1109/icicdt.2005.1502612
File:
PDF, 642 KB
english, 2005