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Enhanced polymeric lithography resists via sequential infiltration synthesis
Tseng, Yu-Chih, Peng, Qing, Ocola, Leonidas E., Czaplewski, David A., Elam, Jeffrey W., Darling, Seth B.Volume:
21
Year:
2011
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/c1jm12461g
File:
PDF, 517 KB
english, 2011