[IEEE 2007 IEEE Symposium on VLSI Technology - Kyoto, Japan (2007.06.12-2007.06.14)] 2007 IEEE Symposium on VLSI Technology - Reliability Perspective of High-k Gate Stack Assessed by Temperature Dependence of Dielectric Breakdown
Okada, Kenji, Horikawa, Tsuyoshi, Satake, Hideki, Inumiya, Seiji, Akasaka, Yasushi, Ootsuka, Fumio, Nara, Yasuo, Ota, Hiroyuki, Nabatame, Toshihide, Toriumi, AkiraYear:
2007
Language:
english
DOI:
10.1109/vlsit.2007.4339716
File:
PDF, 557 KB
english, 2007