![](/img/cover-not-exists.png)
[IEEE 1998 IEEE International SOI Conference Proceedings - Stuart, FL, USA (5-8 Oct. 1998)] 1998 IEEE International SOI Conference Proceedings (Cat No.98CH36199) - The effect of ion implantation on the gate oxide integrity of SOI wafers
Terauchi, M., Samata, S., Kubota, H., Yoshimi, M.Year:
1998
Language:
english
DOI:
10.1109/soi.1998.723143
File:
PDF, 242 KB
english, 1998