Investigation of inductively coupled plasma gate oxide on...

IEEE Electron Device Letters 2002 / 06 Vol. 23; Iss. 6

Investigation of inductively coupled plasma gate oxide on low temperature polycrystalline-silicon TFTs

Chang-Ho Tseng,, Ting-Kuo Chang,, Fang-Tsun Chu,, Jia-Min Shieh,, Bau-Tong Dai,, Huang-Chung Cheng,, Chin, A.
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Volume:
23
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2002.1004226
Date:
June, 2002
File:
PDF, 216 KB
english, 2002
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