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[IEEE 2008 9th International Conference on Ultimate Integration on Silicon (ULIS) - Udine, Italy (2008.03.12-2008.03.14)] 2008 9th International Conference on Ultimate Integration of Silicon - Dielectric characteristics of amorphous and crystalline BaHfO3 high-k layers on TiN for memory capacitor applications
Lupina, G., Kozlowski, G., Dudek, P., Dabrowski, J., Wenger, Ch., Lippert, G., Mussig, H. - J.Year:
2008
Language:
english
DOI:
10.1109/ulis.2008.4527163
File:
PDF, 104 KB
english, 2008