[IEEE 2009 10th International Conference on Ultimate Integration on Silicon (ULIS - Aachen, Germany (2009.03.18-2009.03.20)] 2009 10th International Conference on Ultimate Integration of Silicon - Peculiarities of electrical properties of metal-insulator-semiconductor capacitors based on high-k dielectric stack containing HfTiSiO:N and HfTiO:N films
Mikhelashvili, V., Thangadurai, P., Kaplan, W. D., Eisenstein, G.Year:
2009
Language:
english
DOI:
10.1109/ulis.2009.4897569
File:
PDF, 1.07 MB
english, 2009