[IEEE 10th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP 2002 - Vancouver, BC, Canada (25-27 Sept. 2002)] 10th IEEE International Conference of Advanced Thermal Processing of Semiconductors - Stress release for shallow trench isolation by single-wafer, rapid-thermal steam oxidation
Luoh, T., Chen, C.S., Yang, L.W., Shih, H.H., Chen, K.C., Hsueh, C., Chung, H., Pan, S., Lu, C.Y.Year:
2002
Language:
english
DOI:
10.1109/rtp.2002.1039448
File:
PDF, 616 KB
english, 2002