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[IEEE 2006 International Symposium on Semiconductor Manufacturing (ISSM) - Tokyo, Japan (2006.09.25-2006.09.27)] 2006 IEEE International Symposium on Semiconductor Manufacturing - Use of Vertical Scanning Interferometry to Optimize HDP Oxide Thickness for STI CMP
Beckage, Peter J., Tang, Tito, Lam, Kin-SangYear:
2006
Language:
english
DOI:
10.1109/issm.2006.4493120
File:
PDF, 1.89 MB
english, 2006