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[IEEE 2008 International Workshop on Junction Technology (IWJT) - Shanghai, China (2008.05.15-2008.05.16)] Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) - Flash lamp annealing in diluted oxygen for low sheet resistance and ultra-shallow junctions: Suppression of wet-cleaning-induced sheet-resistance degradation
Shinichi Kato,, Takayuki Aoyama,, Takashi Onizawa,, Yasuo Nara,, Yuzuru Ohji,Year:
2008
Language:
english
DOI:
10.1109/iwjt.2008.4540033
File:
PDF, 102 KB
english, 2008