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[Japan Soc. Appl. Phys 1999 Symposium on VLSI Technology. Digest of Technical Papers - Kyoto, Japan (14-16 June 1999)] 1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325) - Inner cylinder Ta/sub 2/O/sub 5/ capacitor process for 1 Gb DRAM and beyond
Seok Jun Won,, Yong Woo Hyung,, Kab Jin Nam,, Young Dae Kim,, Ki Yeon Park,, Young Wook Park,, Sang In Lee,, Moon Young Lee,Year:
1999
Language:
english
DOI:
10.1109/vlsit.1999.799358
File:
PDF, 222 KB
english, 1999