[IEEE 2002 Symposium on VLSI Technology Digest of Technical...

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[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - Gate postdoping to decouple implant/anneal for gate, source/drain, and extension: maximizing polysilicon gate activation for 0.1 μm CMOS technologies

Park, H., Schepis, D., Mocuta, A.C., Khare, M., Li, Y., Doris, B., Shukla, S., Hughes, T., Dokumaci, O., Narasimha, S., Fung, S., Snare, J., Lee, B.H., Li, J., Ronsheim, P., Domenicucci, A., Varekamp,
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Year:
2002
Language:
english
DOI:
10.1109/vlsit.2002.1015423
File:
PDF, 293 KB
english, 2002
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