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[IEEE Extended Abstracts of the Fourth International Workshop on Junction Technology - Shanghai, China (15-16 March 2004)] The Fourth International Workshop on Junction Technology, 2004. IWJT '04. - The thermal stability of zirconium aluminate high-k film on strained SiGe layer
Zengfeng Di,, Miao Zhang,, Weili Liu,, Suhua Luo,, Zhenghua An,, Zhengxuan Zhang,, Zhitang Song,, Chenglu Lin,Year:
2004
Language:
english
DOI:
10.1109/iwjt.2004.1306857
File:
PDF, 249 KB
english, 2004