A low valent metalorganic precursor for the growth of tungsten nitride thin films by atomic layer deposition
Dezelah, Charles L., El-Kadri, Oussama M., Kukli, Kaupo, Arstila, Kai, Baird, Ronald J., Lu, Jun, Niinist?, Lauri, Winter, Charles H.Volume:
17
Year:
2007
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/b610873c
File:
PDF, 450 KB
english, 2007