[IEEE 1998 Symposium on VLSI Technology Digest of Technical...

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[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Source/drain extension scaling for 0.1 μm and below channel length MOSFETs

Thompson, S., Packan, P., Ghani, T., Stettler, M., Alavi, M., Post, I., Tyagi, S., Ahmed, S., Yang, S., Bohr, M.
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Year:
1998
Language:
english
DOI:
10.1109/vlsit.1998.689229
File:
PDF, 215 KB
english, 1998
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