[IEEE 1998 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (9-11 June 1998)] 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) - Source/drain extension scaling for 0.1 μm and below channel length MOSFETs
Thompson, S., Packan, P., Ghani, T., Stettler, M., Alavi, M., Post, I., Tyagi, S., Ahmed, S., Yang, S., Bohr, M.Year:
1998
Language:
english
DOI:
10.1109/vlsit.1998.689229
File:
PDF, 215 KB
english, 1998