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Sensitivity and limitations of plasma charging damage measurements using MOS capacitors structures
Shawming Ma,, Abdel-Ati, W.L.N., McVittie, P.Volume:
18
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.622516
Date:
September, 1997
File:
PDF, 84 KB
english, 1997