Improved reliability of low-temperature polysilicon TFT by...

IEEE Electron Device Letters 2003 / 03 Vol. 24; Iss. 3

Improved reliability of low-temperature polysilicon TFT by post-annealing gate oxide

Seok-Woo Lee,, Eugene Kim,, Sang-Soo Han,, Hye Sun Lee,, Duk-Chul Yun,, Kyoung Moon Lim,, Myoung-Su Yang,, Chang-Dong Kim,
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
24
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2003.811398
Date:
March, 2003
File:
PDF, 264 KB
english, 2003
Conversion to is in progress
Conversion to is failed