[IEEE 2006 14th International Conference on Advanced Thermal Processing of Semiconductors - Kyoto (2006.10.10-2006.10.13)] 2006 14th IEEE International Conference on Advanced Thermal Processing of Semiconductors - High-Resolution Transmission Electron Microscopy of Interfaces between thin Nickel Layers on Si(001) After Nickel Silicide Formation under Various Annealing Conditions

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