In-situ non-disruptive cleaning of Ge(100) using H2O2(g)...

Surface Science 2014 / 12 Vol. 630

In-situ non-disruptive cleaning of Ge(100) using H2O2(g) and atomic hydrogen

Kaufman-Osborn, Tobin, Kiantaj, Kiarash, Chang, Chorng-Ping, Kummel, Andrew C.
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Volume:
630
Language:
english
Journal:
Surface Science
DOI:
10.1016/j.susc.2014.08.015
Date:
December, 2014
File:
PDF, 954 KB
english, 2014
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