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[IEEE 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2007.04.23-2007.04.25)] 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Evaluation of S/D Resistance (RSD) and Strain Scalability by Mechanical-bending Approach
Wu, Kehuey, Chang, Chih-Sheng, Lin, Hong-Nien, Lee, Wen-ChinYear:
2007
Language:
english
DOI:
10.1109/vtsa.2007.378920
File:
PDF, 2.37 MB
english, 2007