[IEEE 2010 International Workshop on Junction Technology (IWJT) - Shanghai, China (2010.05.10-2010.05.11)] 2010 International Workshop on Junction Technology Extended Abstracts - Technology options for 22nm and beyond
Kuhn, Kelin J., Liu, Mark Y., Kennel, HaroldYear:
2010
Language:
english
DOI:
10.1109/iwjt.2010.5475000
File:
PDF, 652 KB
english, 2010