Monitoring metal ion contamination onset in hydrofluoric...

Monitoring metal ion contamination onset in hydrofluoric acid using silicon–diamond and dual silicon sensing electrode assembly

Ponnuswamy, Thomas, Chen, Jin-Jian, Xu, Fei, Chyan, Oliver
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Volume:
126
Year:
2001
Language:
english
Journal:
The Analyst
DOI:
10.1039/b009841h
File:
PDF, 64 KB
english, 2001
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