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Post Plasma Etch Residue Removal Using CO[sub 2]-TMAHCO[sub 3] Mixtures: Comparison of Single-Phase and Two-Phase Mixtures
Levitin, Galit, Myneni, Satyanarayana, Hess, Dennis W.Volume:
151
Year:
2004
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1723503
File:
PDF, 382 KB
english, 2004