[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Plasma-induced charging damage of a ferroelectric capacitor during interconnect metal etch
Shin Seung Park,, Chang Ju Choi,, Jin Woong Kim,, Jeong Mo Hwang,Year:
2000
Language:
english
DOI:
10.1109/ppid.2000.870648
File:
PDF, 346 KB
english, 2000