[IEEE 2010 International Symposium on Next-Generation...

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[IEEE 2010 International Symposium on Next-Generation Electronics (ISNE) - Kaohsiung, Taiwan (2010.11.18-2010.11.19)] 2010 International Symposium on Next Generation Electronics - A simple process of thin-film transistor using the trench-oxide layer for improving 1T-DRAM performance

Chiu, Hsien-Nan, Lin, Jyi-Tsong, Eng, Yi-Chuen, Chang, Tzu-Feng, Chen, Cheng-Hsin
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Year:
2010
Language:
english
DOI:
10.1109/isne.2010.5669149
File:
PDF, 1.05 MB
english, 2010
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