[IEEE Extended Abstracts of the Fourth International...

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[IEEE Extended Abstracts of the Fourth International Workshop on Junction Technology - Shanghai, China (15-16 March 2004)] The Fourth International Workshop on Junction Technology, 2004. IWJT '04. - I-V-T studies on ternary silicide Co/sub 1-x/Ni/sub x/Si/sub 2//n-Si Schottky contacts

Shiyang Zhu,, Guoping Ru,, Xinping Qu,, Van Meirhaeghe, R.L., Forment, S., Bingzong Li,
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Year:
2004
Language:
english
DOI:
10.1109/iwjt.2004.1306782
File:
PDF, 269 KB
english, 2004
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